The anomalous low temperature resistivity and critical scattering of conduction electrons around the Néel point of α-Mn films containing dilute concentration of Ni

dc.contributor.author	Boakye, F.
dc.contributor.author	Adanu, K.G.
dc.contributor.author	Nkum, R.K.
dc.date.accessioned	2019-02-26T14:59:57Z
dc.date.available	2019-02-26T14:59:57Z
dc.date.issued	2001-06
dc.description.abstract	Electrical resistivity measurements on thermally evaporated Mn100-xNix films (with x = 0.01, 0.02 and 0.05 at.% Ni) have been performed over the temperature range from 300 to 1.4 K using the van der Pauw four probe technique. The Néel point (TN) of the films determined using the model of Graig and Goldburg reveals a shift to upper values as the concentration of Ni is increased. Analysis of the resistivity data near the Néel points of these alloys gave critical exponents which are in moderate agreement with existing theories. The low temperature resistivity of the 0.02 and 0.05 at.% Ni in Mn specimens obeys a T2 law indicating a spin fluctuation scattering mechanism in these alloys. © 2001 Acta Materialia Inc.	en_US
dc.identifier.other	Volume 49, Issue 11,Pages 2095-2101
dc.identifier.other	https://doi.org/10.1016/S1359-6454(01)00049-0
dc.identifier.uri	http://ugspace.ug.edu.gh/handle/123456789/28387
dc.language.iso	en	en_US
dc.publisher	Acta Materialia	en_US
dc.subject	Antiferromagnetic transition	en_US
dc.subject	Critical exponent analysis	en_US
dc.subject	Resistivity	en_US
dc.title	The anomalous low temperature resistivity and critical scattering of conduction electrons around the Néel point of α-Mn films containing dilute concentration of Ni	en_US
dc.type	Article	en_US

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